ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,337, issued on Sept. 30, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (Shanghai).

"Plasma processing device and retractable sealing part thereof" was invented by Zhihao Wang (Shanghai) and Lei Wu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a plasma processing device and a retractable sealing part thereof. The retractable sealing part is arranged in or near a radio-frequency circuit of the plasma processing device. The retractable sealing part includes a bellows assembly having a first end and a second end. Isolation rings are added to an upper part and a lower part of the bellows assembly to weaken long...