ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,037, issued on June 24, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (Shanghai).
"Temperature control apparatus for semiconductor processing equipment, and temperature control method for the same" was invented by Kui Zhao (Shanghai), Hiroshi Iizuka (Shanghai), Dee Wu (Shanghai), Rason Zuo (Shanghai) and Tuqiang Ni (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a temperature control apparatus for semiconductor processing equipment and a corresponding temperature control method, wherein each heating element in each row or each column in a heating element matrix forms a power return circuit with a same power s...