US Patent Issued to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA on Dec. 9 for "Lower electrode assembly and plasma processing device" (Chinese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,350, issued on Dec. 9, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (Shanghai).

"Lower electrode assembly and plasma processing device" was invented by Yichuan Zhang (Shanghai) and Rubin Ye (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a lower electrode assembly and a plasma processing device in which the lower electrode assembly is located. The lower electrode assembly includes a base, including a main part and a step part extending outwardly from the main part, the step part being provided with a screw hole; a dielectric ring, disposed on the step part around the main part, a groove bein...