ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,207, issued on Nov. 25, was assigned to ADEKA Corp. (Tokyo).
"Tin compound, thin-film forming raw material, thin-film, method for producing thin-film, and halogen compound" was invented by Tomoharu Yoshino (Tokyo), Atsushi Yamashita (Tokyo) and Yoshiki Ooe (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a tin compound, which is represented by the following general formula (1): in the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and R5 represents a hydr...