ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,778, issued on July 29, was assigned to ADEKA Corp. (Tokyo).
"Cobalt compound, thin-film forming raw material, thin-film, and method of producing thin-film" was invented by Tomoharu Yoshino (Tokyo), Keisuke Takeda (Tokyo) and Atsushi Yamashita (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a cobalt compound represented by the following general formula (1):where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the fol...