ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,573, issued on Dec. 2, was assigned to ADEKA Corp. (Tokyo).
"Thin-film forming raw material, thin-film and method of producing thin-film" was invented by Masako Hatase (Tokyo), Chiaki Mitsui (Tokyo) and Atsushi Yamashita (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a thin-film forming raw material, including an alkoxide compound represented by the following general formula (1):where R1 to R4 each independently represent an alkyl group having 1 to 5 carbon atoms, M represents a rare earth metal atom, and "n" represents a valence of the rare earth metal atom."
The patent was filed on June 17, 2022, under Application No. 18/571,903...