US Patent Issued to ADEKA on April 1 for "Ruthenium compound, thin-film forming raw material, and method of producing thin film" (Japanese Inventors)

ALEXANDRIA, Va., April 2 -- United States Patent no. 12,264,168, issued on April 1, was assigned to ADEKA Corp. (Tokyo).

"Ruthenium compound, thin-film forming raw material, and method of producing thin film" was invented by Masaki Enzu (Tokyo), Masako Hatase (Tokyo) and Keisuke Takeda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a ruthenium compound represented by the following general formula (1) or (2), a thin-film forming raw material containing the ruthenium compound, and a method of producing a thin-film including using the thin-film forming raw material:where R1 to R12 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a ...