US Patent Issued to Adeia Semiconductor Solutions on June 3 for "Alternating hardmasks for tight-pitch line formation" (New York Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,601, issued on June 3, was assigned to Adeia Semiconductor Solutions LLC (San Jose, Calif.).

"Alternating hardmasks for tight-pitch line formation" was invented by Sean D. Burns (Hopewell Junction, N.Y.), Nelson M. Felix (Briarcliff Manor, N.Y.), Chi-Chun Liu (Altamont, N.Y.), Yann A. M. Mignot (Slingerlands, N.Y.) and Stuart A. Sieg (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming fins includes forming a three-color hardmask fin pattern on a fin base layer. The three-color hardmask fin pattern includes hardmask fins of three mutually selectively etchable compositions. Some of the fins of the first color are etched aw...