US Patent Issued to Adeia Semiconductor Solutions on Feb. 10 for "Forming a sacrificial liner for dual channel devices" (New York, California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,359, issued on Feb. 10, was assigned to Adeia Semiconductor Solutions LLC (San Jose, Calif.).

"Forming a sacrificial liner for dual channel devices" was invented by Huiming Bu (Glenmont, N.Y.), Kangguo Cheng (Schenectady, N.Y.), Dechao Guo (Niskayuna, N.Y.), Sivananda K. Kanakasabapathy (Pleasanton, Calif.) and Peng Xu (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes one or more fins. Each fin includes a top channel portion formed from a channel material, a middle portion, and a bottom substrate portion formed from a same material as an underlying substrate. An oxide layer is formed between the bott...