US Patent Issued to Addison Clear Wave Coatings on March 18 for "High refractive index nano-imprint lithography resin" (Illinois Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,799, issued on March 18, was assigned to Addison Clear Wave Coatings Inc. (St. Charles, Ill.).

"High refractive index nano-imprint lithography resin" was invented by Chau Ha (Glen Ellyn, Ill.) and Martin Newcomb (Glen Ellyn, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photo nanoimprint lithography (P-NIL) resin is disclosed. The P-NIL resin comprises: a cross-linkable organic binder; solvent based inorganic nanoparticles dispersed in the P-NIL resin; and a solvent configured to be evaporated; the P-NIL resin having a viscosity in the range of 4,000 to 6,000 centipoise at 25deg C. after the solvent is evaporated prior to curing the P-NIL r...