US Patent Issued to ACM RESEARCH (SHANGHAI) on June 17 for "Method and apparatus for removing particles or photoresist on substrates" (Chinese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,367, issued on June 17, was assigned to ACM RESEARCH (SHANGHAI) INC. (Shanghai).

"Method and apparatus for removing particles or photoresist on substrates" was invented by Xiaoyan Zhang (Shanghai), Wenjun Wang (Shanghai), Fuping Chen (Shanghai), Jun Wang (Shanghai), Shena Jia (Shanghai), Deyun Wang (Shanghai), Hui Wang (Shanghai), Guangyu Xia (Shanghai) and He Wang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and an apparatus for removing particles or photoresist on substrates. In an embodiment, a method comprises the following steps: transferring one or more substrates into a DIO3 solution accommodated in a DIO3 bath; after the ...