ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,544,807, issued on Feb. 10, was assigned to ACM RESEARCH (SHANGHAI) INC. (Shanghai).
"Wafer cleaning apparatus" was invented by Xideng He (Shanghai), Yang Han (Shanghai), Zhaoming Zhong (Shanghai), Tianyu Huang (Shanghai), Yunxiang Zhao (Shanghai), Xiaofeng Tao (Shanghai), Xinping Deng (Shanghai), Shena Jia (Shanghai) and Hui Wang (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer cleaning apparatus provided by the present invention comprises a rotary shaft, a chuck arranged on the top of the rotary shaft for retaining the wafer, a fixed shaft coaxially passed through the rotary shaft, and an upper end cover and a lower end cover that bloc...