US Patent Issued to ABB SCHWEIZ on Jan. 20 for "Systems and methods for measuring trace contaminants in gas matrix using integrated cavity output spectroscopy" (Canadian, American Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,600, issued on Jan. 20, was assigned to ABB SCHWEIZ AG (Baden, Switzerland).

"Systems and methods for measuring trace contaminants in gas matrix using integrated cavity output spectroscopy" was invented by Francois Tanguay (Levis, Canada), Bertrand Simon Lanher (San Jose, Calif.) and John Brian Leen (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A laser absorption spectrometry system for gas measurement is provided. The system includes an integrated cavity output spectroscopy (ICOS) assembly including a gas cell. The gas cell includes a cell body defining an optical cavity and an input mirror and an output mirror positioned in the...