ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,394,911, issued on Aug. 19, was assigned to 3M Innovative Properties Co. (St. Paul, Minn.).

"Anti-reflective assemblies" was invented by Dipankar Ghosh (Oakdale, Minn.), Weigang Lin (Shanghai), Jie Huang (Shanghai), Min Ding (Shanghai), Wei Li (Shanghai) and Kun Wang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Anti-reflective assemblies comprise: a high dielectric permittivity substrate comprising a ceramic and a nonporous multilayer anti-reflective film contacting or adhesively bonded to the substrate. The nonporous multilayer anti-reflective film comprises sequential first, second, and third layers of sequentially decreasing dielectric pe...