US Patent Issued on Sept. 23 for "Antimicrobial knitted fabric and a method of manufacturing thereof" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,634, issued on Sept. 23.

"Antimicrobial knitted fabric and a method of manufacturing thereof" was invented by Jack Lin (Jinjiang, China), Hiu Ying Lam (Hong Kong) and Hei Man LAM (Jinjiang, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to an antimicrobial knitted fabric, comprising at least one first knitted layer comprises one or more first yarns comprising a metallic material, wherein the first yarns are arranged to provide a plurality of free-floating loop structures at a surface of the first knitted layer thereby increasing surface area of the metallic material-comprising first yarns to enhance antimicrobial effect ...