ALEXANDRIA, Va., Oct. 28 -- United States Patent no. D1,100,241, issued on Oct. 28.
"Phototherapy mask" was invented by Baihui Ou (Shenzhen, China), Alain Dijkstra (Amstelveen, Netherlands) and Zhang Yu (Shenzhen, China).
The patent was filed on Aug. 20, 2024, under Application No. D/958,424.
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