ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,683, issued on May 27.
"Structure and methods of forming the structure" was invented by Tae Heui Kwong (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Capacitors, apparatus including a capacitor, and methods for forming a capacitor are provided. One such capacitor may include a first conductor a second conductor above the first conductor, and a dielectric between the first conductor and the second conductor. The dielectric does not cover a portion of the first conductor; and the second conductor does not cover the portion of the first conductor not covered by the dielectric."
The patent was filed on April 5, 2024, under Applicati...