ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,165, issued on May 20.
"Trilayer photoresist system and method for patterning organic devices" was invented by Daniel Bachman (Edmonton, Canada), Qianshu Wang (St. John's, Canada) and Mohammad Maadi (Edmonton, Canada).
According to the abstract* released by the U.S. Patent & Trademark Office: "A trilayer resist system design and method for patterning organic devices including organic light emitting diode (OLED) devices suited for high-definition light field displays. The trilayer resist system is comprised of a fluoropolymer base layer, an inorganic transfer layer and a top positive-type photoresist layer that protects organics formed upon a substrate from damage resulting from t...