ALEXANDRIA, Va., June 16 -- United States Patent no. 12,304,793, issued on May 20.
"Gas-liquid mixture filling device and gas-liquid mixture filling method" was invented by Chih-Meng Wang (Taichung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a gas-liquid mixture filling device and a gas-liquid mixture filling method. The gas-liquid mixture filling device includes a tank and a filling body. The tank defines a first gas chamber and a first liquid mixing space. The filling body comprises an accommodating chamber and a plurality of pouring ports, the accommodating chamber defines a second gas chamber and a second liquid mixing space, and the plurality of pouring ports ...