ALEXANDRIA, Va., July 30 -- United States Patent no. D1,086,444, issued on July 29.

"Face mask" was invented by Daniel Yee (Santa Margarita, Calif.), Jana Bacinska (Brno, Czech Republic), Jose Antonio Fosado Rodriguez (Santa Barbara, Mexico), Marie K. Hammer (Smithfield, R.I.), Mark Peurifoy (Phoenix), Sayanti Basu (Fort Mill, S.C.) and Alex Rochat (Ames, Iowa).

The patent was filed on May 22, 2024, under Application No. D/943,537.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1086444&OS=D1086444&RS=D1086444

Disclaimer: Curated by HT Syndication....