US Patent Issued on July 22 for "System and process with assisted gas flow inside a reaction chamber" (California Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,364,964, issued on July 22.

"System and process with assisted gas flow inside a reaction chamber" was invented by Yan Wang (Sunnyvale, Calif.), Lu Yang (Fremont, Calif.) and Liang-Yuh Chen (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A processing system and method of producing a particulate material are provided. The processing system includes a system inlet connected to one or more gas lines to deliver one or more gases into the processing system, a buffer chamber, a dispersion chamber, a heating assembly, a reaction chamber and a system outlet for delivering particulate material out of the processing system. The method includes del...