ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,533, issued on July 22.
"Hybrid metrology method and system" was invented by Gilad Barak (Rehovot, Israel), Yanir Hainick (Tel-Aviv, Israel) and Yonatan Oren (Kiryat Ono, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light co...