ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,807, issued on July 22.
"Exposure device and method" was invented by Chun-Jung Chiu (New Taipei, Taiwan), Chun-Hsiung Chen (New Taipei, Taiwan) and Wan-Chen Chuang (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure device and method for semiconductor manufacturing, focusing on the creation of exposure patterns with High Dynamic Range (HDR) capabilities, is disclosed. The exposure device includes a laser source, a first spatial light modulator (SLM), specifically a Liquid Crystal on Silicon (LCOS) device, and a second SLM, specifically a Digital Micromirror Device (DMD). The LCOS is positioned upstream in the optical path ...