US Patent Issued on Dec. 9 for "Photoacid generators, photoresist compositions, and pattern formation methods" (Massachusetts Inventor)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,241, issued on Dec. 9.

"Photoacid generators, photoresist compositions, and pattern formation methods" was invented by Emad Aqad (Northborough, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Photoacid generators comprising a moiety of formula (1):wherein: Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar1 and R1 are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid genera...