ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,090, issued on Dec. 16.
"Formation of superhydrophobic surfaces" was invented by Antonio Checco (Stony Brook, N.Y.), Benjamin M. Ocko (Stony Brook, N.Y.), Atikur Rahman (Pune, India) and Charles T. Black (New York).
According to the abstract* released by the U.S. Patent & Trademark Office: "Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate. The methods may comprise applying a precursor to the patterned block copolymer to generate an infiltrated block copolymer. The precursor may infiltrate into the first polymer block domain and generate a materia...