US Patent Issued on Aug. 26 for "Methods of forming electronic devices using pitch reduction" (Idaho, California Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,857, issued on Aug. 26.

"Methods of forming electronic devices using pitch reduction" was invented by Luan C. Tran (Meridian, Idaho) and Raghupathy Giridhar (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of a method for device fabrication by reverse pitch reduction flow include forming a first pattern of features above a substrate and forming a second pattern of pitch-multiplied spacers subsequent to forming the first pattern of features. In embodiments of the invention the first pattern of features may be formed by photolithography and the second pattern of pitch-multiplied spacers may be formed by pitch multiplication...