US Patent Issued on April 29 for "Carrier head for chemical mechanical polishing apparatus comprising substrate receiving member" (South Korean Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,285,839, issued on April 29.

"Carrier head for chemical mechanical polishing apparatus comprising substrate receiving member" was invented by Joon Mo Kang (Seongnam, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A carrier head for a chemical mechanical polishing apparatus comprises: a base; a substrate receiving member comprising a plate portion having an outer surface for receiving a substrate and an inner surface at the back of the outer surface, a perimeter portion extended in a height direction from an edge of the plate portion, a securing portion extended from an outer part of the perimeter portion and connected to a lower part of the b...