US Patent Issued on April 15 for "Double-parameter in-situ sensor based on waveguide grating, a sensing system and a preparation method" (Chinese Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,837, issued on April 15.

"Double-parameter in-situ sensor based on waveguide grating, a sensing system and a preparation method" was invented by Jiandong Bai (Shanxi, China), Xinyu Zhao (Shanxi, China), Xiaoyu Gao (Shanxi, China), Yongqiu Zheng (Shanxi, China) and Chenyang Xue (Shanxi, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to the field of sensing technology, and discloses a double-parameter in-situ sensor based on waveguide grating, a sensing system and a preparation method. The sensor comprises an optical waveguide substrate, wherein a first straight optical waveguide and a second straight optical waveguide are a...