INTERNATIONAL PATENT: ZEON CORPORATION, 日本ゼオン株式会社 FILES APPLICATION FOR "POSITIVE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER"

GENEVA, Oct. 5 -- ZEON CORPORATION (6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008246), 日本ゼオン株式会社 (東京都千代田区丸の内一丁目６番２号) filed a patent application (PCT/JP2024/042438) for "POSITIVE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER" on Nov 29, 2024. With publication no. WO/2025/203874, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(...