GENEVA, Oct. 3 -- YEUNG, Tsun Kwan (Rm G, 8/F, Blk 6, Mont Vert, 9 Fung Yuen Road, Tai Po, N.T.Hong Kong) filed a patent application (PCT/CN2025/077111) for "MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION DEVICE" on Feb 13, 2025. With publication no. WO/2025/200828, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): YEUNG, Tsun Kwan (Rm G, 8/F, Blk 6, Mont Vert, 9 Fung Yuen Road, Tai Po, N.T.Hong Kong)
Abstract: A Microwave Plasma-enhanced Chemical Vapor Deposition (MPCVD) Device is provided. The MPCVD device comprises...