INTERNATIONAL PATENT: WISCONSIN ALUMNI RESEARCH FOUNDATION FILES APPLICATION FOR "SILICON-GERMANIUM HETEROSTRUCTURES WITH SHEAR STRAIN AND GERMANIUM CONCENTRATION OSCILLATIONS FOR ENHANCED VALLEY SPLITTING"

GENEVA, April 21 -- WISCONSIN ALUMNI RESEARCH FOUNDATION (614 Walnut Street, 13th FloorMadison, Wisconsin 53726) filed a patent application (PCT/US2024/028472) for "SILICON-GERMANIUM HETEROSTRUCTURES WITH SHEAR STRAIN AND GERMANIUM CONCENTRATION OSCILLATIONS FOR ENHANCED VALLEY SPLITTING" on May 09, 2024. With publication no. WO/2025/080306, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FRIESEN, Mark G. (6617 Maywood AvenueMiddleton, Wisconsin 53562), WOODS, Benjamin (9121 Waterside StreetApt. 215Middleton, Wisconsin 53...