INTERNATIONAL PATENT: WESTERN DIGITAL TECHNOLOGIES, INC. FILES APPLICATION FOR "SHUNT REDUCING MIGRATION BARRIER LAYER MATERIALS AND INSERTION TECHNIQUES FOR EPITAXIAL TOPOLOGICAL MATERIALS"

GENEVA, Aug. 13 -- WESTERN DIGITAL TECHNOLOGIES, INC. (5601 Great Oaks ParkwaySan Jose, California 95119) filed a patent application (PCT/US2025/013800) for "SHUNT REDUCING MIGRATION BARRIER LAYER MATERIALS AND INSERTION TECHNIQUES FOR EPITAXIAL TOPOLOGICAL MATERIALS" on Jan 30, 2025. With publication no. WO/2025/166014, the details related to the patent application was published on Aug 07, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LE, Quang (C/O Western Digital Technologies, Inc.5601 Great Oaks ParkwaySan Jose, California 95119), YORK, Brian R. (C/O Western Digital Technologies, Inc.5...