INTERNATIONAL PATENT: WASHINGTON UNIVERSITY FILES APPLICATION FOR "SYSTEMS AND METHODS FOR MANUFACTURING HIGH-EFFICIENCY CAPACITOR LAYERS AND CAPACITORS WITH 2D/3D STRUCTURES"

GENEVA, July 14 -- WASHINGTON UNIVERSITY (One Brookings DriveSt. Louis, Missouri 63130) filed a patent application (PCT/US2025/010077) for "SYSTEMS AND METHODS FOR MANUFACTURING HIGH-EFFICIENCY CAPACITOR LAYERS AND CAPACITORS WITH 2D/3D STRUCTURES" on Jan 02, 2025. With publication no. WO/2025/147508, the details related to the patent application was published on Jul 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BAE, Sang-Hoon (c/o Washington UniversityOne Brookings DriveSt. Louis, Missouri 63130), HAN, Sangmoon (c/o Washington UniversityOne Brookings DriveSt. Louis, Missouri 63130)

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