INTERNATIONAL PATENT: UNIVERSITEIT ANTWERPEN, IMEC VZW FILES APPLICATION FOR "MASK ASSEMBLY FOR EDGE ILLUMINATION PHASE CONTRAST RADIATION IMAGING"

GENEVA, Nov. 24 -- UNIVERSITEIT ANTWERPEN (Prinsstraat 132000 Antwerpen), IMEC VZW (Kapeldreef 753001 Leuven) filed a patent application (PCT/EP2025/062978) for "MASK ASSEMBLY FOR EDGE ILLUMINATION PHASE CONTRAST RADIATION IMAGING" on May 13, 2025. With publication no. WO/2025/237942, the details related to the patent application was published on Nov 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DE BEENHOUWER, Jan (c/o RIVA, Valorisation office, Middelheimlaan 12020 Antwerpen), SIJBERS, Jan (c/o RIVA, Valorisation office, Middelheimlaan 12020 Antwerpen), VANTHIENEN, Pieter-Jan (c/o RIV...