INTERNATIONAL PATENT: TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING AG, TRUMPF LASER AG FILES APPLICATION FOR "EUV DRIVER LASER FOR GENERATING AN EUV LIGHT-EMITTING PLASMA, SYSTEM FOR EXPOSING SEMICONDUCTOR SUBSTRATES COATED WITH A PHOTOSENSITIVE COATING TO EUV LIGHT AND METHOD FOR GENERATING A COMBINED EXCITATION LIGHT BEAM"

GENEVA, Sept. 16 -- TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING AG (Johann-Maus-StraBe 271254 Ditzingen), TRUMPF LASER AG (Aichhalder Strasse 3978713 Schramberg) filed a patent application (PCT/EP2024/056171) for "EUV DRIVER LASER FOR GENERATING AN EUV LIGHT-EMITTING PLASMA, SYSTEM FOR EXPOSING SEMICONDUCTOR SUBSTRATES COATED WITH A PHOTOSENSITIVE COATING TO EUV LIGHT, AND METHOD FOR GENERATING A COMBINED EXCITATION LIGHT BEAM" on Mar 08, 2024. With publication no. WO/2025/185831, the details related to the patent application was published on Sep 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO)....