INTERNATIONAL PATENT: TRUMPF LASER SE, TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE FILES APPLICATION FOR "METHOD AND LASER SYSTEM FOR GENERATING A PLASMA OF A TARGET MATERIAL FOR GENERATING A SECONDARY RADIATION AND/OR FOR MEDIATING A NUCLEAR FUSION REACTION"

GENEVA, Nov. 30 -- TRUMPF LASER SE (Aichhalder Strasse 3978713 Schramberg), TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE (Johann-Maus-Strasse 271254 Ditzingen) filed a patent application (PCT/EP2025/060508) for "METHOD AND LASER SYSTEM FOR GENERATING A PLASMA OF A TARGET MATERIAL FOR GENERATING A SECONDARY RADIATION AND/OR FOR MEDIATING A NUCLEAR FUSION REACTION" on Apr 16, 2025. With publication no. WO/2025/242367, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BRUNNE, Jens (Fangelsbachstrasse 2670180 Stuttgar...