GENEVA, Aug. 11 -- TRUMPF HUTTINGER GMBH + CO. KG (Botzinger StraBe 8079111 Freiburg) filed a patent application (PCT/EP2025/052232) for "DUAL PLASMA APPLICATOR FOR A PLASMA GENERATOR, PLASMA GENERATOR, PLASMA PROCESSING SYSTEM, AND METHOD FOR IGNITING A PLASMA" on Jan 29, 2025. With publication no. WO/2025/162982, the details related to the patent application was published on Aug 07, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SCHLUNDT, Johannes (Georg-Friedrich-Str. 3076131 Karlsruhe)
Abstract:
The invention relates to a dual plasma applicator (10) for a plasma generator (30) for ig...