INTERNATIONAL PATENT: TOSOH CORPORATION, 東ソー株式会社 FILES APPLICATION FOR "METAL SPUTTERING TARGET, METAL SPUTTERING TARGET STRUCTURE, METHOD FOR PRODUCING FILM USING SAME AND METHOD FOR PRODUCING METAL SPUTTERING TARGET"

GENEVA, Feb. 25 -- TOSOH CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7468501), 東ソー株式会社 (山口県周南市開成町４５６０番地) filed a patent application (PCT/JP2024/029116) for "METAL SPUTTERING TARGET, METAL SPUTTERING TARGET STRUCTURE, METHOD FOR PRODUCING FILM USING SAME, AND METHOD FOR PRODUCING METAL SPUTTERING TARGET" on Aug 15, 2024. With publication no. WO/2025/037642, the details related to the patent application was published on Feb 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Pr...