INTERNATIONAL PATENT: TOSOH CORPORATION, 東ソー株式会社 FILES APPLICATION FOR "GALLIUM NITRIDE FILM, METHOD FOR PRODUCING SAME, LAMINATED SUBSTRATE, SEMICONDUCTOR ELEMENT AND ELECTRONIC APPARATUS"

GENEVA, April 15 -- TOSOH CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7468501), 東ソー株式会社 (山口県周南市開成町４５６０番地) filed a patent application (PCT/JP2024/035161) for "GALLIUM NITRIDE FILM, METHOD FOR PRODUCING SAME, LAMINATED SUBSTRATE, SEMICONDUCTOR ELEMENT, AND ELECTRONIC APPARATUS" on Oct 01, 2024. With publication no. WO/2025/075016, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO)....