INTERNATIONAL PATENT: TORAY INDUSTRIES, INC., 東レ株式会社 FILES APPLICATION FOR "PHOTOSENSITIVE RESIN COMPOSITION, PATTERN PRODUCTION METHOD, CURED PRODUCT, ELECTRONIC COMPONENT AND DISPLAY DEVICE"

GENEVA, July 3 -- TORAY INDUSTRIES, INC. (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038666), 東レ株式会社 (東京都中央区日本橋室町２丁目１番１号) filed a patent application (PCT/JP2024/045276) for "PHOTOSENSITIVE RESIN COMPOSITION, PATTERN PRODUCTION METHOD, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY DEVICE" on Dec 20, 2024. With publication no. WO/2025/135176, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Pr...