INTERNATIONAL PATENT: TOKYO OHKA KOGYO CO., LTD., 東京応化工業株式会社 FILES APPLICATION FOR "RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, RADICAL POLYMERIZATION INITIATOR, CHAIN TRANSFER AGENT AND POLYMER"

GENEVA, Oct. 5 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神奈川県川崎市中原区中丸子１５０番地) filed a patent application (PCT/JP2025/010729) for "RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, RADICAL POLYMERIZATION INITIATOR, CHAIN TRANSFER AGENT, AND POLYMER" on Mar 19, 2025. With publication no. WO/2025/205331, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) ...