INTERNATIONAL PATENT: TOKYO OHKA KOGYO CO., LTD., 東京応化工業株式会社 FILES APPLICATION FOR "RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, RADICAL POLYMERIZATION INITIATOR, CHAIN TRANSFER AGENT AND POLYMER"

GENEVA, Aug. 25 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神奈川県川崎市中原区中丸子１５０番地) filed a patent application (PCT/JP2025/003380) for "RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, RADICAL POLYMERIZATION INITIATOR, CHAIN TRANSFER AGENT, AND POLYMER" on Feb 03, 2025. With publication no. WO/2025/173572, the details related to the patent application was published on Aug 21, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC)...