GENEVA, Dec. 22 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神奈川県川崎市中原区中丸子１５０番地) filed a patent application (PCT/JP2025/012505) for "RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, ACID GENERATION AGENT, AND ACID DIFFUSION CONTROL AGENT" on Mar 27, 2025. With publication no. WO/2025/258179, the details related to the patent application was published on Dec 18, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, w...