GENEVA, Jan. 6 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神奈川県川崎市中原区中丸子１５０番地) filed a patent application (PCT/JP2025/019911) for "POROUS MEMBRANE, RESIST COMPOSITION PURIFICATION METHOD, AND RESIST FILM MANUFACTURING METHOD" on Jun 02, 2025. With publication no. WO/2026/004486, the details related to the patent application was published on Jan 02, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World...