INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "WET PROCESSING SYSTEM AND NOZZLE FOR DISPENSING A LIQUID LATERALLY ACROSS A SEMICONDUCTOR WAFER"

GENEVA, Aug. 19 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-Chome, Minato-KuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/010487) for "WET PROCESSING SYSTEM AND NOZZLE FOR DISPENSING A LIQUID LATERALLY ACROSS A SEMICONDUCTOR WAFER" on Jan 06, 2025. With publication no. WO/2025/170691, the details related to the patent application was published on Aug 14, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NASMAN, Ronald (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203)

Abstract: The prese...