INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "SYSTEMS AND METHODS THAT UTILIZE METAL-COATED PROCESSING HEADS TO IMPROVE WET PROCESSING OF SEMICONDUCTOR SUBSTRATES"

GENEVA, Dec. 16 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/022361) for "SYSTEMS AND METHODS THAT UTILIZE METAL-COATED PROCESSING HEADS TO IMPROVE WET PROCESSING OF SEMICONDUCTOR SUBSTRATES" on Mar 31, 2025. With publication no. WO/2025/254720, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HU, Shan (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203)

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