INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOTORESIST FILM STACK"

GENEVA, May 19 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (2400 Grove BoulevardAustin, Texas 78741) filed a patent application (PCT/US2024/043873) for "METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOTORESIST FILM STACK" on Aug 26, 2024. With publication no. WO/2025/101248, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TAPILY, Kandabara (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203), LIU, Eric Chih-Fang (NanoFab 300...