INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "METAL RECESS DEPTH MEASUREMENTS BY CAPACITOR TEST STRUCTURE"

GENEVA, Feb. 4 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/021435) for "METAL RECESS DEPTH MEASUREMENTS BY CAPACITOR TEST STRUCTURE" on Mar 26, 2025. With publication no. WO/2026/024325, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MUKHOPADHYAY, Partha (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203), FULFORD, H. Jim (NanoFab 300 South 255 Fuller Rd., S...