INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "GAP FILLING BY ATOMIC LAYER DEPOSITION (ALD)"

GENEVA, Oct. 6 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/015042) for "GAP FILLING BY ATOMIC LAYER DEPOSITION (ALD)" on Feb 07, 2025. With publication no. WO/2025/207214, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): IWAO, Toshihiko (650 MitsuzawaHosaka-cho, Nirasaki City, Yamanashi 407-0192), ZHAO, Jianping (401 S 1st St, Suite 900Austin, Texas 78704)

Abstract: A method...