INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "ETCH SELECTIVITY MODULATION BY FLUOROCARBON TREATMENT"

GENEVA, March 4 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (2400 Grove BoulevardAustin, Texas 78741) filed a patent application (PCT/US2024/034544) for "ETCH SELECTIVITY MODULATION BY FLUOROCARBON TREATMENT" on Jun 18, 2024. With publication no. WO/2025/042467, the details related to the patent application was published on Feb 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): OTTO IV, Ivo (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203), KANAKI, Toshiki (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, ...